FESEM and FIB Used in Area-selective Atomic Layer Deposition Research

Surface Science cover for volume 690 December 2019.
Raman confocal images of Al2O3 make the cover of Surface Science.

Graduate students Mikhail Trought (Chemistry) and Chathura de Alwis (Chemistry), with undergraduate student alumnus Isobel Wentworth (ChemEng), research assistant professor Timothy R. Leftwich (MSE), and assistant professor Kathryn A. Perrine (Chemistry) published a paper titled “Influence of surface etching and oxidation on the morphological growth of Al2O3 by ALD” in Surface Science on August 9, 2019.

https://doi.org/10.1016/j.susc.2019.121479

The authors acknowledge the Applied Chemical & Morphological Analysis Laboratory (ACMAL) at Michigan Technological University for use of instruments and staff assistance, including Director Owen Mills, for training on the FESEM and FIB.

M. Trought and K. Perrine prepared the samples at Michigan Tech and at the Univ. of Minnesota, performed the surface analysis, analyzed all data collected, and wrote the manuscript. T. Leftwich assisted with the XPS data collection and analysis, and reviewing & editing the manuscript. I. Wentworth and C. de Alwis assisted with sample preparation and FTIR analysis. K. Perrine conceptualized the project.


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